The models M-RES 2xxxM are semi-automatically operating
systems. The wafer is placed on the wafer shuttle. The
resistance measurement is performed using a mapping plan
which can be build to meet the application requirementst
plan. With appropriate design of the measurement plan
results in a meaningful picture of the resistivity
distribution of the sample.
These systems are applied, e.g. in the
process of development of EPI, implant-, metallization- and
other thin-film processes of conductive layers or in
manufacturing process monitoring.